字典二二>英语词典>sputtering翻译和用法

sputtering

英 [ˈspʌtərɪŋ]

美 [ˈspʌtərɪŋ]

v.  (引擎、灯或火)发噼啪声; 气急败坏地说; 急促而语无伦次地说
sputter的现在分词

复数:sputterings 

计算机化学

COCA.27161

柯林斯词典

  • VERB (发动机)发出噼啪声;(火焰)发出毕剥声
    If something such as an engine or a flamesputters, it works or burns in an uneven way and makes a series of soft popping sounds.
    1. The truck sputtered and stopped...
      卡车噼啪响了几声停下了。
    2. Engines sputtered to life again...
      发动机噼啪噼啪地重新开动了。
    3. The flame sputters out.
      火焰毕剥作响。
    4. ...the sputtering engine.
      噼啪作响的发动机
    5. Sputteris also a noun.
    6. All I could hear was the sputter of the fire.
      我只能听到火的毕剥声。
  • VERB (过程、行动或事态)缓慢不稳地进行,慢慢结束
    If a process, action, or state of affairssputters, it progresses slowly and unevenly or starts to end.
    1. The economy is already sputtering, with low or no growth...
      经济发展速度已经放慢,增长率很低,或者根本没有增长。
    2. The battle sputtered to a halt in mid-October...
      战斗于 10 月中旬渐渐停了下来。
    3. The whole thing sputtered out.
      整个事态渐渐平息了下来。
  • VERB (尤指因生气、震惊或激动)结结巴巴地说话,语无伦次地说话
    If yousputter, you speak with difficulty and make short sounds, especially because you are angry, shocked, or excited.
    1. Stunned, I sputtered, 'What do you mean?'...
      我大吃一惊,结结巴巴地问道:“你是什么意思?”
    2. Our father's face had reddened with rage and he began to sputter...
      我们的父亲气得涨红了脸,说话开始语无伦次。
    3. He began to sputter his reply.
      他开始结结巴巴地回答。

英英释义

noun

双语例句

  • ZnO: Al thin films were prepared on slide glass substrates by non-reactive DC magnetron sputtering at room temperature.
    采用直流磁控溅射工艺,室温下在载玻片上制备了氧化锌铝透明导电薄膜。
  • Influence of RF sputtering power and doped hydrogen on the structure of Si ∶ Hfilms
    射频溅射功率和掺杂氢对硅氢薄膜结构的影响
  • Niobium oxide optical thin films have been prepared by low frequency reactive magnetron sputtering system.
    利用低频反应磁控溅射制备五氧化二铌光学薄膜。
  • Graphitelike carbon film was deposited on silicon substrates by unbalanced magnetron sputtering.
    利用非平衡磁控溅射技术在单晶硅基底上沉积了类石墨非晶碳膜。
  • Study of Structure and Performance of Unbalanced Magnetron Sputtering MoS_2-Ti Coating Affected by Deposition Pressure
    沉积压力对非平衡磁控溅射沉积MoS2-Ti复合薄膜的结构与性能影响研究
  • Tin oxide films were deposited on silicon substrates at room temperature using the radio frequency ( RF) magnetron sputtering with different sputtering power.
    应用射频磁控溅射技术在硅基底上制备氧化锡薄膜,着重研究溅射功率对薄膜结构和电化学性能的影响。
  • In sputtering, argon is commonly used, havingthe advantage that it is an atomic gas and chemicallyinert.
    溅射中我们通常使用氩,优点是氩是一种原子气体,而且在化学性质上是惰性的。
  • Influence of Substrate Temperature on Performance of Transparent Conductive ZAO Film Deposited by RF Sputtering
    衬底温度对射频溅射沉积ZAO透明导电薄膜性能的影响
  • Deposition rate is an important parameter in magnetron sputtering and influenced by many factors.
    沉积速率是磁控溅射镀膜技术中的一项重要指标,它由许多因素决定。
  • The sputtering pressures plays an important role on the microstructure and electrical resistivity of TAZO films.
    溅射压强对薄膜的电阻率和微观结构有显著影响。